Micro/Nanofabrication

TECHNOLOGY

Micro/Nanostructure Research
for Optical Information

Simulation, micro/nano research and application validation for optical acquisition, control and transmission.

SPECTRAL COMPUTING / ALGORITHM CHAIN

From On-Chip Acquisition to Spectral Information

Physical channels acquire encoded signals. Calibration and reconstruction recover spectral information, while recognition and inversion connect it to applications.

Reference input → Response matrixSTEP 01

Spectral Calibration

Reference sources and instruments measure channel responses to relate wavelength, intensity and channel signals.

Spectral reconstruction and validationSTEP 02

Spectral Reconstruction

Reconstruct up to 120 bands from 16 physical-channel responses, with resolution and stability evaluated against reference spectra.

Spatial features × Spectral featuresImage-region recognition / Pixel spectraSTEP 03

Spectral Image Recognition

Combine spatial texture and spectral features for classification, region recognition and anomaly detection, retaining images for verification.

Feature extraction → Model inversion → Reference evaluationSTEP 04

Spectral Feature Inversion

Build models using target characteristics, reference measurements and project samples; estimate parameters and evaluate application scope.

METASURFACE / EXPERIMENTAL RESULTS

From Metasurface Structures to Spectral Recovery

Metasurface samples, micro/nanostructure characterization and module spectral-imaging tests.

Metasurface samples
01 / Metasurface Samples

Physical samples and structural forms.

SEM metasurface array with original dimension labels
02 / Micro/Nanostructure Characterization

SEM characterization of metasurface arrays.

Metasurface array microscopy
03 / Array Microscopy

Microscopy of different unit-cell regions.

Monochrome Module × Metasurface: Spectral Recovery

Compare monochrome-module images with spectral recovery after metasurface integration.

Monochrome module color-chart image
Monochrome Module ImageGrayscale acquisition
Recovered color-chart image after metasurface integration
Spectral recovery after metasurface integrationOriginal color, noise and imaging detail retained

METASURFACE OPTICS / DESIGN TO TEST

Metasurface Microlenses: Design, Fabrication & Coupling

Incident wavefront → Phase array → FocusSTEP 01

Phase & Optical Path Design

Design planar microlens phase profiles and optical paths for the target band, numerical aperture and working distance.

Electron-beam writing / Array fabricationSTEP 02

Micro/Nano Sample Fabrication

Translate unit-cell and array layouts into fabrication using EBL, imprinting and supporting processes.

CharacterizationFocal spot and energy distributionSTEP 03

Structure & Focusing Characterization

Optical microscopy, SEM and spot measurements assess geometry, focus position and energy distribution.

Reference path / Coupled reception / Power comparisonSTEP 04

Coupling & Insertion Loss

Compare actual inputs, receivers and reference paths to evaluate coupling efficiency, insertion loss and alignment sensitivity.

Planar focusing lens sample
Planar lens sample from the report

2D Optical Spot

Horizontal and Vertical Intensity Profiles

Optical-spot test data from the research report, with software toolbars removed for presentation.

Sample insertion loss: 0.75 dB, for the reported sample, test optical path and alignment conditions.

04 / DEVICE & SYSTEM CO-DESIGN

Device Design
for System Requirements

Optical structures, signal conversion and electronic readout jointly determine equipment performance.
Co-design for the operating band, signal intensity and interface requirements.

Micro/Nanofabrication
Optical input / Optical path matching01 / INPUT

Optical Input

Define incidence conditions and target signals

Micro/nanostructures / Optical field control02 / PHOTONIC DEVICE

Devices & Micro/Nanostructures

Structure response and optical field control

Array readout / Channel signals03 / SYSTEM INTERFACE

Readout & Equipment Interfaces

Electronic signal chains and evaluation methods

06 / TECHNOLOGY FOUNDATION

From Optical Principles
to Validated
Device Designs

Building on simulation and EBL facilities,
we work with industry partners on design, fabrication and testing.

Modeling · Optical field distribution · Parameter analysisSpectral computation workflow01

Simulation

Micro/nanostructure modeling, optical response simulation and parameter optimization.

Electron-beam scanning · Resist patterning02

EBL Micro/Nanofabrication

Electron-beam patterning and sample development using suitable materials and supporting fabrication processes.

Chip · Interconnect · Substrate · Packaging03

Process & Packaging Collaboration

Material selection, fabrication processes and optoelectronic interface integration with process and packaging partners.

Sample testing · Specification comparison · Joint evaluation04

Joint Validation

Agree on test conditions, metrics and evaluation methods to guide the next iteration.

Materials, fabrication scope and supporting processes are confirmed for each project.

CONTACT

Technical Enquiries
& Collaboration.

Contact us for product selection, development
and project collaboration.

Get in Touch ↗
TECHNICAL COLLABORATIONBD@zhongkeyaoguang.com ↗

266 Fangzheng Avenue, High-tech Park, Liangjiang New Area, Chongqing, China

Zhongke Yaoguang (Chongqing) Optoelectronics Technology Co., Ltd.
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